The furnace tube chemical vapor deposition (TFCVD) machine in Beijing Sanhe Union belongs to thermal CVD, which uses high temperature to drive precursor decomposition and thin film growth. The Sanhe Union TFCVD series machines are domestically developed furnace tube chemical vapor deposition machines for large-area two-dimensional (2D) material growth, which can achieve both continuous thin film growth and atomic layer thin film growth. Domestic brand, trustworthy.

The Beijing Sanhe furnace tube chemical vapor deposition machine (TFCVD) belongs to thermal CVD, which uses high temperature to drive precursor decomposition and thin film growth. The Sanhe Union TFCVD series machines are developed for large-area two-dimensional (2D) material growth, which can achieve both continuous thin film growth and atomic layer thin film growth.

Main configuration of Sanhe furnace tube chemical vapor deposition (TFCVD)：

1. Support sample size: 6 inches downward compatible, compatible with various small-sized samples;

2. Temperature range: Room temperature~800/1000/1200 degrees optional, temperature control accuracy ± 3 ℃ @>200 ℃;

3. Single/double-layer quartz tube design;

4. Front stage pump: mechanical oil pump/dry pump optional;

5. Pressure control: 0~10 Torr is optional, and non pressure control mode configuration can also be selected;

6. Process gases: H2, O2, N2, Ar;

7. Gas range: determined according to user application requirements and system design, selectable within the range of 0~300 sccm;

8. Precursor source: configurable powder/liquid/solid precursor sources, up to 8 channels, supporting bubbling/loading and mixed drive precursor sources;

9. The temperature control range of the source can be customized from 5 to 200 ℃;

10. Optional plasma module;

11. Fully automatic one key control system;

炉管式化学气相沉积机台 (TFCVD) 主要应用：

1. 晶圆级WS2，MoS2 等2D材料生长；

炉管式化学气相沉积机台 (TFCVD) 实验结果：

2 nm WS₂ 拉曼光谱测试

炉管式化学气相沉积机台 (TFCVD) 设备Layout：

TFCVD 机台 Layout