Delayer is a crucial technology in the semiconductor industry, widely used in fields such as failure analysis, reverse engineering, and process development. With the continuous progress of chip manufacturing technology, device sizes continue to shrink, structures become increasingly complex, and there is a scarcity of personnel for layer removal in the market industry, as well as long training times for hands-on experience.
Beijing Sanhe Lian Technology Co., Ltd. is an independent manufacturer of domestically developed reactive ion etching machines. After long-term process validation and practical application by customers on site, we have accumulated a large number of effective process parameters and experience both domestically and internationally, and can achieve deep etching of silicon. Beijing Sanhe Lian Technology creates a domestic reaction ion etching machine brand, providing assistance to domestic reaction ion etching machine brands!